High-purity nitrogen is used as a protective and carrier gas in the manufacture of integrated circuits, semiconductors, and vacuum electronic devices; it serves as a carrier gas in chemical vapor deposition; it carries the gas in liquid diffusion sources; and it acts as a protective gas for devices in high-temperature diffusion furnaces.
High-purity nitrogen is used as a gas for displacement, drying, storage, and transport in processes such as epitaxy, photolithography, cleaning, and evaporation. Nitrogen purity of 99.99% or higher is required in cathode ray tube manufacturing. In aerospace technology, liquid hydrogen refueling systems must first be purged with high-purity nitrogen, followed by high-purity helium.
In December 2025, the State Administration for Market Regulation approved and released the national standard material for high-purity nitrogen, which is used in key processes such as cleaning, etching, and deposition in semiconductor device manufacturing, as well as in processes such as photolithography, ion implantation, and oxidation in integrated circuit production.